Solution Properties of the System ZrSiO4–HfSiO4: A Computational and Experimental Study-Reference-Cited by-同舟云学术

Solution Properties of the System ZrSiO4–HfSiO4: A Computational and Experimental Study

Published:2013-05-06 Issue:19 Volume:117 Page:10013-10019
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Cota Agustín¹²,Burton Benjamin P.³,Chaín Pablo¹,Pavón Esperanza⁴,Alba María D.¹

Affiliation:

1. Instituto Ciencia de los Materiales de Sevilla (CSIC-US), Avda. Americo Vespucio 49, 41092-Sevilla, Spain

2. Laboratorio de rayos-X (CITIUS), Avda. Reina Mercedes 4b, 41012-Sevilla, Spain

3. Material Measurements Laboratory, Metallurgy Division, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States

4. Unité de Catalyse et de Chimie du Solide, UCCS, CNRS, UMR8181, Université Lille Nord de France, 59655 Villeneuve d’Ascq, France

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp401539g

Reference46 articles.

1. Laser treatment of plasma-sprayed ZrSiO4 coatings

2. Production of coloured zircon pigments from zircon

3. Application of membrane technology for the treatment of effluent from a zirconium silicate production process

4. Low-Temperature Polycrystalline Silicon Thin-Film Flash Memory With Hafnium Silicate

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