Rewritable Microrelief Formation on Photoresponsive Hydrogel Layers-Reference-Cited by-同舟云学术

Rewritable Microrelief Formation on Photoresponsive Hydrogel Layers

Published:2007-04-28 Issue:11 Volume:19 Page:2730-2732
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Szilágyi András¹,Sumaru Kimio¹,Sugiura Shinji¹,Takagi Toshiyuki¹,Shinbo Toshio¹,Zrínyi Miklós¹,Kanamori Toshiyuki¹

Affiliation:

1. Research Center of Advanced Bionics, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8565, Japan, and HAS-BME Materials Structure and Modeling Research Group, Department of Physical Chemistry and Materials Science, Budapest University of Technology and Economics, Budapest 1521, Hungary

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm070444v

Reference23 articles.

1. In Situ Control of Cell Adhesion Using Photoresponsive Culture Surface

2. Photolithographic patterning of polyethylene glycol hydrogels

3. Photo-responsive hydrogels for potential responsive release applications

4. The Fabrication of a Photoresponsive Molecularly Imprinted Polymer for the Photoregulated Uptake and Release of Caffeine

5. Photoresponsive crown ethers. 2. Photocontrol of ion extraction and ion transport by a bis(crown ether) with a butterfly-like motion

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