Mechanism of Film Growth of Tellurium by Electrochemical Deposition in the Presence and Absence of Cadmium Ions
Author:
Affiliation:
1. Department of Chemical Engineering and Materials Science, University of California Davis, Davis, California 95616
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp053833q
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