Heteroepitaxial Growth of Vertical GaAs Nanowires on Si (111) Substrates by Metal−Organic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Heteroepitaxial Growth of Vertical GaAs Nanowires on Si (111) Substrates by Metal−Organic Chemical Vapor Deposition

Published:2008-10-28 Issue:11 Volume:8 Page:3755-3760
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Bao Xin-Yu¹,Soci Cesare¹,Susac Darija¹,Bratvold Jon¹,Aplin David P. R.¹,Wei Wei¹,Chen Ching-Yang¹,Dayeh Shadi A.¹,Kavanagh Karen L.¹,Wang Deli¹

Affiliation:

1. Department of Electrical and Computer Engineering, University of California San Diego, La Jolla, California 92093-0407, Materials Science Program, University of California San Diego, La Jolla, California 92093-0418, Department of Physics, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl802062y

Reference46 articles.

1. Gallium arsenide and other compound semiconductors on silicon

2. GaAs MESFETs fabricated on Si substrates using a SrTiO3 buffer layer

3. Low-temperature growth of GaAs on Si used for ultrafast photoconductive switches

4. Equilibrium limits of coherency in strained nanowire heterostructures

5. Critical diameter for III-V nanowires grown on lattice-mismatched substrates

Cited by 96 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale Photovoltaics;Photovoltaic Solar Energy;2024-06-21

2. Recent Advances in III–V Compounds/Polymer Hybrid Solar Cells;Solar RRL;2023-07-26

3. Position Control of Self-Grown III–V Nanowire Arrays on Si Substrates via Micrometer-Size Patterns by Photolithography;Crystal Growth & Design;2022-03-03

4. Precursor Concentration Ratio: The Key to Controllable Lateral-to-Standing MoO2 Flake Transition;Chemistry of Materials;2021-07-26

5. Hybrid and heterogeneous photonic integration;APL Photonics;2021-06-01