Fabrication of Thermosensitive Polymer Nanopatterns through Chemical Lithography and Atom Transfer Radical Polymerization-Reference-Cited by-同舟云学术

Fabrication of Thermosensitive Polymer Nanopatterns through Chemical Lithography and Atom Transfer Radical Polymerization

Published:2007-02-22 Issue:7 Volume:23 Page:3981-3987
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

He Qiang¹,Küller Alexander¹,Grunze Michael¹,Li Junbai¹

Affiliation:

1. Beijing National Laboratory for Molecular Sciences (BNLMS), CAS Key Lab of Colloid and Interface Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, China, Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, D-69120 Heidelberg (Germany), and Institute for Molecular Biophysics, University of Maine, Orono, Maine 04469

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la062793u

Reference36 articles.

1. Functional Materials Based on Self-Assembly of Polymeric Supramolecules

2. Surface-Initiated Polymerization for Amplification of Self-Assembled Monolayers Patterned by Microcontact Printing

3. Adsorption of Hydrophilic-Hydrophobic Block Copolymers on Silica from Aqueous Solutions

4. Manipulation of Surface Properties by Patterning of Covalently Bound Polymer Brushes

5. Polymers with Very Low Polydispersities from Atom Transfer Radical Polymerization

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