Effects of Off-Stoichiometry in the Epitaxial NdNiO3 Film on the Suppression of Its Metal-Insulator-Transition Properties-Reference-Cited by-同舟云学术

Effects of Off-Stoichiometry in the Epitaxial NdNiO3 Film on the Suppression of Its Metal-Insulator-Transition Properties

Author:

Yamanaka Takashi¹,Hattori Azusa N.¹^ORCID,Pamasi Liliany Noviyanty²,Takemoto Shohei¹,Hattori Ken²,Daimon Hiroshi²,Sato Kazunori³⁴,Tanaka Hidekazu¹⁴

Affiliation:

1. Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan

2. Graduate School of Science and Technology, Nara Institute of Science and Technology, Ikoma, Nara 630-0192, Japan

3. Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan

4. Center for Spintronics Research Network, Osaka University, Toyonaka, Osaka 560-8531, Japan

Funder

Ministry of Education, Culture, Sports, Science and Technology

Murata Science Foundation

Precursory Research for Embryonic Science and Technology

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference31 articles.

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