Thermal Oxidation of AlInN for III-Nitride Electronic and Optoelectronic Devices
Author:
Affiliation:
1. Center for Photonics and Nanoelectronics, Department of Electrical and Computer Engineering, Lehigh University, Bethlehem, Pennsylvania 18015, United States
Funder
Division of Electrical, Communications and Cyber Systems
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acsaelm.9b00266
Reference24 articles.
1. Surface Protection and Selective Masking during Diffusion in Silicon
2. Hydrolyzation oxidation of AlxGa1−xAs‐AlAs‐GaAs quantum well heterostructures and superlattices
3. Electrical properties of InAlP native oxides for metal–oxide–semiconductor device applications
4. Controlled steam oxidation of AlInAs for microelectronics and optoelectronics applications
5. Native‐oxide defined ring contact for low threshold vertical‐cavity lasers
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