Enhancement of pH Tolerance in Conductive Al-Doped ZnO Nanofilms via Sequential Annealing-Reference-Cited by-同舟云学术

Enhancement of pH Tolerance in Conductive Al-Doped ZnO Nanofilms via Sequential Annealing

Author:

Yan Ruolin¹²,Takahashi Tsunaki¹³^ORCID,Zeng Hao¹,Hosomi Takuro¹³^ORCID,Kanai Masaki¹²,Zhang Guozhu¹,Nagashima Kazuki¹³^ORCID,Yanagida Takeshi¹²^ORCID

Affiliation:

1. Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan

2. Institute for Materials Chemistry and Engineering, Kyushu University, 6-1 Kasuga-Koen, Kasuga, Fukuoka 816-8580, Japan

3. JST, PRESTO, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan

Funder

Ministry of Education, Culture, Sports, Science and Technology

Core Research for Evolutional Science and Technology

Precursory Research for Embryonic Science and Technology

Japan Society for the Promotion of Science

Japan Science and Technology Agency

China Scholarship Council

Chinese Academy of Sciences

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference45 articles.

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