Atomic Layer Deposition of Cobalt Carbide Thin Films from Cobalt Amidinate and Hydrogen Plasma-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Cobalt Carbide Thin Films from Cobalt Amidinate and Hydrogen Plasma

Author:

Fan Qipeng¹,Guo Zheng²^ORCID,Li Zhuangzhi³,Wang Zhengduo¹,Yang Lizhen¹,Chen Qiang¹,Liu Zhongwei¹,Wang Xinwei²^ORCID

Affiliation:

1. Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China

2. School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, China

3. Hebei Advanced Thin Film Laboratory, Department of Physics, Hebei Normal University, Shijiazhuang 050024, China

Funder

National Natural Science Foundation of China

Natural Science Foundation of Guangdong Province

Natural Science Foundation of Beijing Municipality

Beijing Institute of Graphic Communication

Shenzhen Science and Technology Innovation Commission

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

Reference59 articles.

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