Systematic Regeneration of Waste Sulfuric Acid in Semiconductor Manufacturing Using Batch Vacuum Distillation

Author:

Park Seongho1,Jung Jaeheum1,Song Kiwook1,Kshetrimayum Krishnadash S.1,Jeong Changhyun2,Han Chonghun1

Affiliation:

1. School of Chemical and Biological Engineering, Seoul National University, Gwanak-ro 599, Gwanak-gu, Seoul 151-742, South Korea

2. Basic Engineering Department, Samsung Engineering Co. Ltd., Samsung GEC, 26, Sangil-ro 6-gil, Gangdong-gu, Seoul,134-728, South Korea

Publisher

American Chemical Society (ACS)

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference26 articles.

1. Kashkoush, I.; Matthews, R.; Novak, R.; Brause, E.; Carrillo, F.; Rajaram, B.InPhotoresist Stripping Using Ozone/Deionized Water Chemistry;Mater. Res. Soc. Symp. Proc, 1997;Cambridge Univiversity Press:New York, 1997; pp173–180.

2. Schiessler, S.; von Plessen, H.Process for regenerating sulfuric acid. U.S. Patent 3972987, 1976.

3. Brian, P. L.; Chen, M. S.; Mazzafro, W. J.; Vora, S. M.Process for concentrating sulfuric acid in an evaporator. U.S. Patent 4409064, 1983.

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