Maskless Plasma Etching of Diamond Cones: The Role of CH4 Gas and Enhanced Field Emission Property-Reference-Cited by-同舟云学术

Maskless Plasma Etching of Diamond Cones: The Role of CH4 Gas and Enhanced Field Emission Property

Published:2007-04-26 Issue:19 Volume:111 Page:7058-7062
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Wang Q.¹,Li J. J.¹,Li Y. L.¹,Wang Z. L.¹,Gu C. Z.¹,Cui Z.¹

Affiliation:

1. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China, and Rutherford Appleton Laboratory, Chilton, Didcot, Oxon Ox11 0QX, United Kingdom

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp069042l

Reference17 articles.

1. Optimum geometry and space-charge effects in vacuum microelectronics devices

2. Fabrication of 0.1 μm gate aperture Mo-tip field-emitter arrays using interferometric lithography

3. Electron field emission from silicon tip arrays coated by magnetron sputtering carbon nitride film

4. Field emission from high aspect ratio tubular carbon cones grown on gold wire

5. Monte Carlo study of hot electron and ballistic transport in diamond: Low electric field region

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