Ab Initio Studies of Halogenated Methyl and Methylene Radicals: Molecular Structure, Vibrational Frequencies, and Enthalpies of Formation
Author:
Affiliation:
1. Department of Chemistry, University of Inchon, 177 Dohwa-dong, Nam-ku, Inchon, 402-749, Korea
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp971466f
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1. Time‐dependent etching of GaAs and InP with CCl4or HCl plasmas: Electrode material and oxidant addition effects
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