Defect-Dominated Doping and Contact Resistance in MoS2
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn500044q
Reference51 articles.
1. Two-dimensional atomic crystals
2. Synthesis of Large-Area MoS2Atomic Layers with Chemical Vapor Deposition
3. van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates
4. Interfaces and Composition Profiles in Metal–Sulfide Nanolayers Synthesized by Atomic Layer Deposition
5. Controlled Scalable Synthesis of Uniform, High-Quality Monolayer and Few-layer MoS2 Films
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