Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides-Reference-Cited by-同舟云学术

Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

Published:2015-09-23 Issue:39 Volume:7 Page:21884-21889
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Ng Doris K. T.¹,Wang Qian¹,Wang Ting²,Ng Siu-Kit¹,Toh Yeow-Teck¹,Lim Kim-Peng¹,Yang Yi¹,Tan Dawn T. H.²

Affiliation:

1. Data Storage Institute (A*STAR) Agency for Science Technology & Research, DSI Building, 5 Engineering Drive 1, Singapore 117608, Singapore

2. Photonics Devices and Systems Group, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372, Singapore

Funder

Data Storage Institute - A STAR

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b06329

Reference22 articles.

1. Teaching silicon new tricks

2. Broad-band optical parametric gain on a silicon photonic chip

3. Green light emission in silicon through slow-light enhanced third-harmonic generation in photonic-crystal waveguides

4. Silicon-chip-based ultrafast optical oscilloscope

5. Monolithic nonlinear pulse compressor on a silicon chip

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