Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp2-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment-Reference-Cited by-同舟云学术

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Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp2-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment

Published:2015-05-28 Issue:22 Volume:7 Page:12030-12037
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Young Matthias J.¹,Musgrave Charles B.¹²,George Steven M.²³

Affiliation:

1. Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309, United States

2. Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309, United States

3. Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States

Funder

Defense Advanced Research Projects Agency

Division of Chemistry

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b02167

Reference55 articles.

1. Carbon-nanostructures coated/decorated by atomic layer deposition: Growth and applications

2. Graphene transistors

3. Quantum Hall Effect in a Gate-Controlled p-n Junction of Graphene

4. High-κ dielectrics for advanced carbon-nanotube transistors and logic gates

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