Chemically Patterned Inverse Opal Created by a Selective Photolysis Modification Process-Reference-Cited by-同舟云学术

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Chemically Patterned Inverse Opal Created by a Selective Photolysis Modification Process

Published:2015-08-18 Issue:34 Volume:7 Page:19516-19525
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Tian Tian¹,Gao Ning¹,Gu Chen¹,Li Jian¹,Wang Hui¹,Lan Yue¹,Yin Xianpeng¹,Li Guangtao¹

Affiliation:

1. Key Laboratory of Organic Optoelectronics & Molecular Engineering, Department of Chemistry, Tsinghua University, Beijing 100084, China

Funder

Deutsche Forschungsgemeinschaft

National Natural Science Foundation of China

Ministry of Science and Technology of the People's Republic of China

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b06757

Reference35 articles.

1. Photonic Crystal Aqueous Metal Cation Sensing Materials

2. Reactive Photonic Film for Label-Free and Selective Sensing of Cyanide

3. Highly Sensitive Assay for Acetylcholinesterase Activity and Inhibition Based on a Specifically Reactive Photonic Nanostructure

4. Ultra-Subwavelength Two-Dimensional Plasmonic Circuits

5. Photonic-crystal full-colour displays

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