Versatile Wafer-Scale Technique for the Formation of Ultrasmooth and Thickness-Controlled Graphene Oxide Films Based on Very Large Flakes
Author:
Affiliation:
1. CEA Saclay, IRAMIS, NIMBE (UMR 3685), LICSEN, F-91191 Gif sur Yvette, France
2. CEA Saclay, IRAMIS, SPEC, F-91191 Gif sur Yvette, France
3. University Paris-Sud and CNRS, Laboratoire de Chimie Physique, UMR 8000, F-91405 Orsay, France
Funder
Direction Générale de l'Armement
Agence Nationale de la Recherche
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.5b05540
Reference46 articles.
1. The rise of graphene
2. Focusing on Energy and Optoelectronic Applications: A Journey for Graphene and Graphene Oxide at Large Scale
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4. Roll-to-roll production of 30-inch graphene films for transparent electrodes
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