Selective Fragmentation of Radiation-Sensitive Novel Polymeric Resist Materials by Inner-Shell Irradiation-Reference-Cited by-同舟云学术

Selective Fragmentation of Radiation-Sensitive Novel Polymeric Resist Materials by Inner-Shell Irradiation

Published:2015-07-23 Issue:30 Volume:7 Page:16348-16356
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Chagas Gabriela Ramos¹,Satyanarayana Vardhineedi Sri Venkata²,Kessler Felipe³,Belmonte Guilherme Kretzmann¹,Gonsalves Kenneth E.²,Weibel Daniel Eduardo¹

Affiliation:

1. Department of Chemical Physics, Chemical Institute, UFRGS, Porto Alegre, Postal Code 91501-970, Rio Grande do Sul, Brazil

2. School of Basic Sciences, Indian Institute of Technology Mandi, Mandi-175001, Himachal Pradesh, India

3. School of Chemistry and Food, Federal University of Rio Grande, Avenida Itália km 8, Postal Code 96.201-900, Rio Grande, Rio Grande do Sul, Brazil

Funder

Intel Corporation

Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico

Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b03378

Reference32 articles.

1. Resist Materials and Processes for Extreme Ultraviolet Lithography

2. ITRS lithography roadmap: status and challenges

3. http://www.itrs.net/Links/2013ITRS/Summary2013.htm.

4. Outgassing and photochemical studies of photosensitive films upon irradiation at 13.5 nm

5. Vacuum ultraviolet photochemistry of polymers

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