Breakdown and Protection of ALD Moisture Barrier Thin Films-Reference-Cited by-同舟云学术

Breakdown and Protection of ALD Moisture Barrier Thin Films

Published:2015-09-30 Issue:40 Volume:7 Page:22121-22127
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Nehm Frederik¹,Klumbies Hannes¹,Richter Claudia²,Singh Aarti²,Schroeder Uwe²,Mikolajick Thomas²,Mönch Tobias¹,Hoßbach Christoph³,Albert Matthias³,Bartha Johann W.³,Leo Karl¹,Müller-Meskamp Lars¹

Affiliation:

1. Institut für Angewandte Photophysik, Technische Universität Dresden, 01062 Dresden, Germany

2. NaMLab gGmbH, Nöthnitzer Straße 64, 01187 Dresden, Germany

3. Institut für Halbleiter und Mikrosystemtechnik, Technische Universität Dresden, 01062 Dresden, Germany

Funder

Bundesministerium für Bildung und Forschung

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.5b06891

Reference25 articles.

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4. Water ingress into and climate dependent lifetime of organic photovoltaic cells investigated by calcium corrosion tests

5. Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

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