New High Strength Low-k Spin-On Thin Films for IC Application
Author:
Affiliation:
1. DuPont CR&D, Experimental Station E328/232A, Wilmington, Delaware 19880-0328, and Materials Science and Engineering Department, University of Illinois at Urbana−Champaign, 1304 West Green St., Urbana, Illinois 61801
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma0518398
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5. CONCENTRATES
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