Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF2: Enhanced Reaction Rate and Precursor Transport
Author:
Affiliation:
1. Department of Materials Science, Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States
2. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
Funder
Air Force Office of Scientific Research
U.S. Department of Energy
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/am508443s
Reference33 articles.
1. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching
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5. Progress in extreme ultraviolet mask repair using a focused ion beam
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