Photoionization of Three Isomers of the C9H7 Radical
Author:
Affiliation:
1. Institute of Physical Chemistry, University of Würzburg, Am Hubland, D-97074 Würzburg, Germany, and Paul Scherrer Institut, Villigen 5232, Switzerland
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp9068569
Reference42 articles.
1. Flash pyrolysis nozzle for generation of radicals in a supersonic jet expansion
2. The vacuum ultraviolet photochemistry of the allyl radical investigated using synchrotron radiation
3. The VUV photochemistry of radicals: C3H3and C2H5
4. Photoionization and dissociative photoionization of the allyl radical, C3H5
5. The photoionisation of two phenylcarbenes and their diazirine precursors investigated using synchrotron radiation
Cited by 55 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Gas-phase formation of the resonantly stabilized 1-indenyl (C 9 H 7 • ) radical in the interstellar medium;Science Advances;2023-09-08
2. Radical–Radical Reactions in Molecular Weight Growth: The Phenyl + Propargyl Reaction;The Journal of Physical Chemistry A;2023-03-11
3. Can the quasi‐molecule concept help in deciphering planarity? The case of polycyclic aromatic hydrocarbons;International Journal of Quantum Chemistry;2022-10-28
4. The role of radical-radical chain-propagating pathways in the phenyl + propargyl reaction;Proceedings of the Combustion Institute;2022-10
5. Continuous Pyrolysis Microreactors: Hot Sources with Little Cooling? New Insights Utilizing Cation Velocity Map Imaging and Threshold Photoelectron Spectroscopy;The Journal of Physical Chemistry A;2022-03-22
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3