Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing-Reference-Cited by-同舟云学术

Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing

Published:2014-05-07 Issue:10 Volume:6 Page:7180-7188
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Ferrarese Lupi Federico¹,Giammaria Tommaso Jacopo¹²,Seguini Gabriele¹,Vita Francesco³,Francescangeli Oriano³,Sparnacci Katia²,Antonioli Diego²,Gianotti Valentina²,Laus Michele²,Perego Michele¹

Affiliation:

1. Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy

2. Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ‘‘A. Avogadro’’, INSTM, UdR Alessandria, Viale T. Michel 11, 1512 Alessandria, Italy

3. Dipartimento di Scienze e Ingegneria della Materia, dell’Ambiente ed Urbanistica and CNISM, Università Politecnica delle Marche, Via Brecce Bianche, 60131 Ancona, Italy

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am5003074

Reference54 articles.

1. Templating Nanoporous Polymers with Ordered Block Copolymers

2. Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses

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5. Block Copolymer Film with Sponge-Like Nanoporous Strucutre for Antireflection Coating

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