Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists
Author:
Affiliation:
1. Department of Chemical Engineering
2. Department of Chemistry, The University of Texas at Austin, Austin, Texas 78712
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn7001079
Reference18 articles.
1. Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography
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