Proximity Effects of the Selective Atomic Layer Deposition of Cobalt on the Nanoscale: Implications for Interconnects-Reference-Cited by-同舟云学术

Proximity Effects of the Selective Atomic Layer Deposition of Cobalt on the Nanoscale: Implications for Interconnects

Published:2021-07-30 Issue:8 Volume:4 Page:8447-8454
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Breeden Michael¹,Wang Victor¹,Spiegelman Jacob¹,Anurag Ashay¹,Wolf Steven F.¹,Moser Daniel²,Kanjolia Ravindra K.²,Moinpour Mansour²,Woodruff Jacob²,Nemani Srinivas³,Wong Keith³,Winter Charles H.⁴^ORCID,Kummel Andrew C.⁵^ORCID

Affiliation:

1. Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, United States

2. EMD Performance Materials, Haverhill, Massachusetts 01831, United States

3. Applied Materials, Sunnyvale, California 95054, United States

4. Department of Chemistry, Wayne State University, Detroit, Michigan 48202, United States

5. Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093, United States

Funder

National Nanotechnology Initiative

Applied Materials

Semiconductor Research Corporation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.1c01639

Reference25 articles.

1. The search for the most conductive metal for narrow interconnect lines

2. Influence of phonon, geometry, impurity, and grain size on Copper line resistivity

3. Characterization of Selectively Deposited Cobalt Capping Layers: Selectivity and Electromigration Resistance

4. Review—Management of Copper Damascene Plating

5. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

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3. Understanding electromigration failure behaviors of narrow cobalt lines and the mechanism of reliability enhancement for extremely dilute alloying of manganese oxide;Journal of Alloys and Compounds;2024-01

4. Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces;Journal of Vacuum Science & Technology A;2023-08-28

5. Self-aligned patterning of tantalum oxide on Cu/SiO2 through redox-coupled inherently selective atomic layer deposition;Nature Communications;2023-07-26