Affiliation:
1. Department of Chemical Engineering, Colorado School of Mines, Golden, Colorado 80401
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
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1. Formation of SiO2 thin films through plasma- enhanced chemical vapor deposition using SiH4/Ar/N2O;Thin Solid Films;2024-05
2. Feature scale modeling of pulsed plasma-enhanced chemical vapor deposition;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-09
3. Self limiting deposition of pyrite absorbers by pulsed PECVD;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-03
4. Mechanically robust silica-like coatings deposited by microwave plasmas for barrier applications;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-11
5. Dielectric performance of hybrid alumina-silicone nanolaminates synthesized by plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-11