Plasmonic Properties of Anchored Nanoparticles Fabricated by Reactive Ion Etching and Nanosphere Lithography-Reference-Cited by-同舟云学术

Plasmonic Properties of Anchored Nanoparticles Fabricated by Reactive Ion Etching and Nanosphere Lithography

Published:2007-02-28 Issue:11 Volume:111 Page:4116-4124
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Hicks Erin M.¹,Lyandres Olga¹,Hall W. Paige¹,Zou Shengli¹,Glucksberg Matthew R.¹,Van Duyne Richard P.¹

Affiliation:

1. Department of Chemistry, Northwestern University, 2145 Sheridan Rd, Evanston, Illinois 60208-3113, Biomedical Engineering Department, Northwestern University, 2145 Sheridan Rd, Evanston, Illinois 60208-3113, and Chemistry Department, University of Central Florida, 4000 Central Florida Blvd, Orlando, Florida 32816-2366

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp064094w

Reference38 articles.

1. Aligned carbon nanotubes for nanoelectronics

2. Band-Gap Engineering of Semiconductor Nanowires through Composition Modulation

3. Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces

4. Nanosphere Lithography: Size-Tunable Silver Nanoparticle and Surface Cluster Arrays

5. Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography

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