Attachment of 3-(Aminopropyl)triethoxysilane on Silicon Oxide Surfaces: Dependence on Solution Temperature-Reference-Cited by-同舟云学术

Attachment of 3-(Aminopropyl)triethoxysilane on Silicon Oxide Surfaces: Dependence on Solution Temperature

Published:2008-10-23 Issue:22 Volume:24 Page:12963-12971
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Pasternack Robert M.¹,Rivillon Amy Sandrine¹,Chabal Yves J.¹

Affiliation:

1. Department of Biomedical Engineering, Rutgers University, Piscataway, New Jersey 08854, Material Research Center, Air Products and Chemicals, Inc., Allentown, Pennsylvania 18195, and Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la8024827

Reference37 articles.

1. Covalently attached organic monolayers on semiconductor surfaces

2. Patterning and Visualizing Self-Assembled Monolayers with Low-Energy Electrons

3. Preparation and characterization of (3-aminopropyl)triethoxysilane-coated magnetite nanoparticles

4. Adhesion of microbes using 3-aminopropyl triethoxy silane and specimen stabilisation techniques for analytical transmission electron microscopy

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