Hierarchically Structured HKUST-1 Nanocrystals for Enhanced SF6 Capture and Recovery
Author:
Affiliation:
1. School of Chemical and Biomedical Engineering, Nanyang Technological University, Singapore 637459, Singapore
2. Singapore Membrane Technology Centre, Nanyang Technological University, Singapore 637141, Singapore
Funder
Ministry of Education - Singapore
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.7b00291
Reference40 articles.
1. Sulfur Hexafluoride (SF6) Emission Estimates for China: An Inventory for 1990–2010 and a Projection to 2020
2. Abatement of Sulfur Hexafluoride Emissions from the Semiconductor Manufacturing Process by Atmospheric-Pressure Plasmas
3. Recovery of SF/sub 6/ from N/sub 2//SF/sub 6/ gas mixtures by using a polymer membrane
4. Problems of the application of N2/SF6 mixtures to gas-insulated bus
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