Molecular Characterization of Bonding Interactions at the Buried Steel Oxide–Aminopropyl Triethoxysilane Interface Accessed by Ar Cluster Sputtering-Reference-Cited by-同舟云学术

Molecular Characterization of Bonding Interactions at the Buried Steel Oxide–Aminopropyl Triethoxysilane Interface Accessed by Ar Cluster Sputtering

Author:

Marcoen Kristof¹^ORCID,Gauvin Mélanie²,De Strycker Joost²,Terryn Herman¹³^ORCID,Hauffman Tom¹

Affiliation:

1. Research Group of Electrochemical and Surface Engineering (SURF), Vrije Universiteit Brussel, Pleinlaan 2, 1050 Brussels, Belgium

2. OCAS NV, President John F. Kennedylaan 3, 9060 Zelzate, Belgium

3. Department of Materials Science and Engineering, Delft University of Technology, Mekelweg 2, 2628 CD Delft, The Netherlands

Funder

Fonds Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference43 articles.

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