Low-Temperature Removal of Dissociated Bromine by Silicon Atoms for an On-Surface Ullmann Reaction-Reference-Cited by-同舟云学术

Low-Temperature Removal of Dissociated Bromine by Silicon Atoms for an On-Surface Ullmann Reaction

Published:2020-08-14 Issue:36 Volume:124 Page:19675-19680
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Sun Kewei¹,Nishiuchi Tomohiko²^ORCID,Sahara Keisuke²,Kubo Takashi²^ORCID,Foster Adam S.³⁴^ORCID,Kawai Shigeki¹⁵^ORCID

Affiliation:

1. Research Center for Advanced Measurement and Characterization, National Institute for Materials Science, 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan

2. Department of Chemistry, Graduate School of Science, Osaka University, Toyonaka 560-0043, Japan

3. Department of Applied Physics, Aalto University School of Science, P.O. Box 11100, Espoo FI-00076, Finland

4. WPI Nano Life Science Institute (WPI-NanoLSI), Kanazawa University, Kakuma-machi, Kanazawa 920-1192, Japan

5. Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-8571, Japan

Funder

Ministry of Education, Culture, Sports, Science and Technology

Japan Society for the Promotion of Science

National Institute for Materials Science

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.0c06188

Reference52 articles.

1. Nano-architectures by covalent assembly of molecular building blocks

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3. Porous graphenes: two-dimensional polymer synthesis with atomic precision

4. Reversible Bergman cyclization by atomic manipulation

5. On-Surface Formation of One-Dimensional Polyphenylene through Bergman Cyclization

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