Successive Strong Electrostatic Adsorptions of [RhCl6]3– on Tungstated-Ceria as an Original Approach to Preserve Rh Clusters From Sintering Under High-Temperature Reduction-Reference-Cited by-同舟云学术

Successive Strong Electrostatic Adsorptions of [RhCl6]3– on Tungstated-Ceria as an Original Approach to Preserve Rh Clusters From Sintering Under High-Temperature Reduction

Published:2021-11-03 Issue:45 Volume:125 Page:25094-25111
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Miller Jeffrey T.¹^ORCID,Schweitzer Neil M.²^ORCID,Aouine Mimoun³,Vernoux Philippe⁴,Boufar Abdelmalik⁵,Blanchard Juliette⁵^ORCID,Krafft Jean-Marc⁵,Méthivier Christophe⁵,Sayag Céline⁵,Ser Frédéric⁶,Sicard Mickaël⁶^ORCID,Thomas Cyril⁵^ORCID

Affiliation:

1. Davidson School of Chemical Engineering, Purdue University, 480 Stadium Mall Drive, West Lafayette, Indiana 47907-2100, United States

2. Department of Chemical and Biological Engineering, Northwestern University, Evanston, Illinois 60208-3113, United States

3. Université de Lyon, Université Claude Bernard Lyon 1, CNRS, Institut Lumière Matière, F-69622 Villeurbanne, France

4. Université de Lyon, CNRS, Université Claude Bernard Lyon, IRCELYON, 2 Avenue Albert Einstein, F-69626 Villeurbanne, France

5. Laboratoire Réactivité de Surface, LRS, Sorbonne Université, CNRS, F-75005 Paris, France

6. Multi-Physics for Energetics Department, ONERA Université Paris Saclay, F-91123, Palaiseau, France

Funder

Centre National de la Recherche Scientifique

Sorbonne Universit??

French Aerospace Lab,Office National d'Etudes et de Recherches A??rospatiales

Office National d'Etudes et de Recherches A??rospatiales

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c07644

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5. Nature of stable single atom Pt catalysts dispersed on anatase TiO2