Contrasting H-Etching to OH-Etching in Plasma-Assisted Nucleation of Carbon Nanotubes-Reference-Cited by-同舟云学术

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Contrasting H-Etching to OH-Etching in Plasma-Assisted Nucleation of Carbon Nanotubes

Published:2021-04-06 Issue:14 Volume:125 Page:7849-7855
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Van de Sompel Phaedra¹,Khalilov Umedjon¹²^ORCID,Neyts Erik C.¹^ORCID

Affiliation:

1. PLASMANT Research Group, NANOLab Center of Excellence, University of Antwerp, Universiteitsplein 1, 2610 Antwerp, Belgium

2. Institute of Ion-Plasma and Laser Technologies, Academy of Sciences of the Republic of Uzbekistan, 33 Durmon Yuli Street, Tashkent 100125, Uzbekistan

Funder

Fonds Wetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.0c11166

Reference52 articles.

1. Helical microtubules of graphitic carbon

2. Single-shell carbon nanotubes of 1-nm diameter

3. Oxygen-doped carbon nanotubes for near-infrared fluorescent labels and imaging probes

4. Plasma Modification of Carbon Nanotubes

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