Density Functional Theory Study of the Adsorption and Dissociation of Copper(I) Acetamidinates on Ni(110): The Effect of the Substrate
Author:
Affiliation:
1. Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México, Apartado Postal 14, Ensenada, Baja California 22800, México
2. Department of Chemistry, University of California, Riverside, California 92521, United States
Funder
University of California, Riverside
Basic Energy Sciences
Direcci?n General de Asuntos del Personal Acad?mico, Universidad Nacional Aut?noma de M?xico
Consejo Nacional de Ciencia y Tecnolog?a
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.0c04521
Reference105 articles.
1. Advances in copper CVD for the semiconductor industry
2. Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies
3. Chemical vapour deposition of coatings
4. Recent Advances in Chemical Vapor Deposition
5. Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry
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