Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces
Author:
Affiliation:
1. Marian Smoluchowski Institute of Physics, Jagiellonian University, Krakow 30-348, Poland
2. Institute of Physics, Montanuniversität Leoben, Leoben 8700, Austria
Funder
Österreichische Agentur für Internationale Mobilität und Kooperation in Bildung, Wissenschaft und Forschung
Narodowe Centrum Nauki
Ministerstwo Nauki i Szkolnictwa Wyzszego
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.5b04384
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