Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN-Reference-Cited by-同舟云学术

Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN

Published:2024-04-29 Issue:18 Volume:128 Page:7591-7600
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Diulus J. Trey¹^ORCID,Naclerio Andrew E.²,Boscoboinik Jorge Anibal³^ORCID,Head Ashley R.³^ORCID,Strelcov Evgheni¹,Kidambi Piran R.²⁴⁵^ORCID,Kolmakov Andrei¹^ORCID

Affiliation:

1. Nanoscale Device Characterization Division, PML, NIST, Gaithersburg, Maryland 20899, United States

2. Department of Chemical and Biomolecular Engineering, Vanderbilt University, Nashville, Tennessee 37212, United States

3. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States

4. Department of Mechanical Engineering, Vanderbilt University, Nashville, Tennessee 37212, United States

5. Vanderbilt Institute of Nanoscale Sciences and Engineering, Nashville, Tennessee 37212, United States

Funder

U.S. Department of Energy

Division of Chemical, Bioengineering, Environmental, and Transport Systems

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.4c00253

Reference43 articles.

1. Core level photoelectron spectroscopy of heterogeneous reactions at liquid–vapor interfaces: Current status, challenges, and prospects

2. From Surfaces to Interfaces: Ambient Pressure XPS and Beyond

3. Understanding Catalyst Surfaces during Catalysis through Near Ambient Pressure X-ray Photoelectron Spectroscopy

4. Present and new frontiers in materials research by ambient pressure x-ray photoelectron spectroscopy

5. Electron microphysics at plasma–solid interfaces