Competition between Pauli Exclusion and H-Bonding: H2O and NH3 on Silicene
Author:
Affiliation:
1. Department of Physics, ‡Key Laboratory of Advanced Energy Storage Materials of Guangdong Province, and §School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, People’s Republic of China
Funder
Ministry of Education of the People's Republic of China
National Natural Science Foundation of China
KLGHEI
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.6b05273
Reference39 articles.
1. Electronic structure of silicon-based nanostructures
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5. Much stronger binding of metal adatoms to silicene than to graphene: A first-principles study
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