Selective Hydroxylation of In2O3 as A Route to Site-Selective Atomic Layer Deposition
Author:
Affiliation:
1. Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
2. Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616, United States
Funder
Basic Energy Sciences
U.S. Department of Energy
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.2c01311
Reference43 articles.
1. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
2. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
3. Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
4. Inherently Selective Atomic Layer Deposition and Applications
5. Site-Selective Passivation of Defects in NiO Solar Photocathodes by Targeted Atomic Deposition
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