Dependence of Photothermal Rate Enhancements of Urethane Formation upon the Nature of Light Exposure and Solution Viscosity-Reference-Cited by-同舟云学术

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Dependence of Photothermal Rate Enhancements of Urethane Formation upon the Nature of Light Exposure and Solution Viscosity

Published:2023-06-13 Issue:25 Volume:127 Page:11958-11965
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Ginder Nathaniel C.¹,Lear Benjamin James¹^ORCID

Affiliation:

1. Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States

Funder

Army Research Office

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c01311

Reference35 articles.

1. Generating heat with metal nanoparticles

2. High-Temperature Organic Reactions at Room Temperature Using Plasmon Excitation: Decomposition of Dicumyl Peroxide

3. Degradation of polypropylene carbonate through plasmonic heating

4. Fe3O4 nanoparticles as robust photothermal agents for driving high barrier reactions under ambient conditions

5. Heat Dissipation for Au Particles in Aqueous Solution: Relaxation Time versus Size

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