Dynamic Langmuir Model: A Simpler Approach to Modeling Capacitive Deionization
Author:
Affiliation:
1. Functional Materials, Applied Physics Department, SCI School, KTH Royal Institute of Technology, Isafjordsgatan 22, SE-16440 Kista, Stockholm, Sweden
Funder
Vetenskapsr?det
Stiftelsen f?r Milj?strategisk Forskning
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
http://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.9b04198
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