UV-Laser Interference Lithography for Local Functionalization of Plasmonic Nanostructures with Responsive Hydrogel-Reference-Cited by-同舟云学术

UV-Laser Interference Lithography for Local Functionalization of Plasmonic Nanostructures with Responsive Hydrogel

Published:2020-01-10 Issue:5 Volume:124 Page:3297-3305
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Quilis Nestor Gisbert¹,Hageneder Simone¹,Fossati Stefan¹,Auer Simone K.¹,Venugopalan Priyamvada¹²,Bozdogan Anil²,Petri Christian³,Moreno-Cencerrado Alberto⁴,Toca-Herrera Jose Luis⁴,Jonas Ulrich³^ORCID,Dostalek Jakub¹^ORCID

Affiliation:

1. BioSensor Technologies, AIT-Austrian Institute of Technology GmbH, Konrad-Lorenz-Strasse 24, 3430 Tulln, Austria

2. CEST Kompetenzzentrum für elektrochemische Oberflächentechnologie GmbH, TFZ, Wiener Neustadt, Viktor-Kaplan-Strasse 2, 2700 Wiener Neustadt, Austria

3. Macromolecular Chemistry, Department Chemistry-Biology, University of Siegen, Adolf Reichwein-Strasse 2, Siegen 57076, Germany

4. Institute for Biophysics, Department of Nanobiotechnology, University of Natural Resources and Life Sciences Vienna (BOKU), Muthgasse 11, Vienna 1190, Austria

Funder

Agence Nationale de la Recherche

?sterreichische Forschungsf?rderungsgesellschaft

Austrian Science Fund

H2020 Marie Sklodowska-Curie Actions

H2020 Health

FEMTEC

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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