Electron–Phonon Relaxation at Au/Ti Interfaces Is Robust to Alloying: Ab Initio Nonadiabatic Molecular Dynamics-Reference-Cited by-同舟云学术

Electron–Phonon Relaxation at Au/Ti Interfaces Is Robust to Alloying: Ab Initio Nonadiabatic Molecular Dynamics

Author:

Wang Yi-Siang¹,Zhou Xin²^ORCID,Tomko John A.³,Giri Ashutosh⁴,Hopkins Patrick E.³⁴⁵^ORCID,Prezhdo Oleg V.¹⁶^ORCID

Affiliation:

1. Department of Chemistry, University of Southern California, Los Angeles, California 90089, United States

2. College of Environment and Chemical Engineering, Dalian University, Dalian, 116622, P. R. China

3. Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22903, United States

4. Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22903, United States

5. Department of Physics, University of Virginia, Charlottesville, Virginia 22903, United States

6. Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, United States

Funder

U.S. Department of Defense

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference72 articles.

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

5. Adhesion of thin metallic layers on Au surfaces;Journal of Physics: Condensed Matter;2022-05-06