Probing the Electronic Surface Properties and Bandgap Narrowing of in situ N, W, and (W,N) Doped Magnetron-Sputtered TiO2 Films Intended for Electro-Photocatalytic Applications-Reference-Cited by-同舟云学术

Probing the Electronic Surface Properties and Bandgap Narrowing of in situ N, W, and (W,N) Doped Magnetron-Sputtered TiO2 Films Intended for Electro-Photocatalytic Applications

Published:2015-12-23 Issue:1 Volume:120 Page:631-638
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Pandiyan Rajesh¹,Delegan Nazar¹,Dirany Ahmad²,Drogui Patrick²,El Khakani My Ali¹

Affiliation:

1. Institut National de la Recherche Scientifique, Centre-Énergie, Matériaux et Télécommunications, 1650 Blvd. Lionel−Boulet, Varennes, QC J3X-1S2, Canada

2. Institut National de la Recherche Scientifique, Centre Eau, Terre et Environnement, 490 Rue de la Couronne, Québec, QC G1K-9A9, Canada

Funder

Fonds de Recherche du Québec - Nature et Technologies

Natural Sciences and Engineering Research Council of Canada

Ministère de l'Économie, de l'Innovation et des Exportations, Gouvernement du Québec

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.5b08057

Reference58 articles.