Dopant-Induced Diffusion Processes at Metal–Oxide Interfaces Studied for Iron- and Chromium-Doped MgO/Mo(001) Model Systems-Reference-Cited by-同舟云学术

Dopant-Induced Diffusion Processes at Metal–Oxide Interfaces Studied for Iron- and Chromium-Doped MgO/Mo(001) Model Systems

Author:

Benedetti Stefania¹,Nilius Niklas²,Valeri Sergio¹³,Tosoni Sergio⁴,Albanese Elisa⁴,Pacchioni Gianfranco⁴

Affiliation:

1. Istituto Nanoscienze, CNR, Via G. Campi 213/a, 41125 Modena, Italy

2. Institut für Physik, Carl von Ossietzky Universität, D-26111 Oldenburg, Germany

3. Dipartimento di Scienze Fisiche, Informatiche e Matematiche, Università di Modena e Reggio Emilia, via Campi 213/a, 41125 Modena, Italy

4. Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca, via Cozzi 53, 20125 Milano, Italy

Funder

Ministero dell’Istruzione, dell’Università e della Ricerca

Deutsche Forschungsgemeinschaft

European Cooperation in Science and Technology

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference33 articles.

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献