Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2

Author:

Park Bo-Eun,Oh Il-Kwon,Lee Chang Wan,Lee Gyeongho,Shin Young-Han1,Lansalot-Matras Clement2,Noh Wontae2,Kim Hyungjun,Lee Han-Bo-Ram3

Affiliation:

1. Department of Physics, University of Ulsan, Ulsan 44610, Korea

2. Air Liquide Korea Co., LTD., Seoul 03722, Korea

3. Department of Material Science Engineering, Incheon National University, Incheon 22012, Korea

Funder

Ministry of Education

Korea Evaluation Institute of Industrial Technology

Ministry of Science, ICT and Future Planning

Ministry of Knowledge Economy

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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