Ni Drastically Modifies the Microstructure and Electrochemistry of Thin Ti and Cr Layers

Author:

Kousar Ayesha1ORCID,Quliyeva Ulviyya1,Pande Ishan1ORCID,Sainio Jani2,Julin Jaakko3ORCID,Sajavaara Timo3,Jiang Hua2,Laurila Tomi14ORCID

Affiliation:

1. Department of Electrical Engineering and Automation, School of Electrical Engineering, Aalto University, PO Box 13500, 00076 Aalto, Finland

2. Department of Applied Physics, School of Science, Aalto University, PO Box 15100, 00076 Aalto, Finland

3. Department of Physics, University of Jyväskylä, PO Box 35, FI-40014 Jyväskylä, Finland

4. Department of Chemistry and Materials Science, School of Chemical Engineering, Aalto University, PO Box 16100, 00076 Aalto, Finland

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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