Probing Plasmon-Induced Chemical Mechanisms by Free-Radical Nanophotopolymerization-Reference-Cited by-同舟云学术

Probing Plasmon-Induced Chemical Mechanisms by Free-Radical Nanophotopolymerization

Published:2021-04-19 Issue:16 Volume:125 Page:8719-8731
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Kameche Farid¹²,Heni Wajdi¹²,Telitel Siham¹²,Vidal Loïc¹²,Marguet Sylvie³,Douillard Ludovic⁴^ORCID,Fiorini-Debuisschert Céline⁴,Bachelot Renaud⁵⁶^ORCID,Soppera Olivier¹²^ORCID

Affiliation:

1. Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France

2. Université de Strasbourg, F-67000 Strasbourg, France

3. Université Paris-Saclay, CEA, CNRS, NIMBE, F-91191 Gif-sur-Yvette, France

4. Université Paris-Saclay, CEA, CNRS, SPEC, F-91191 Gif-sur-Yvette, France

5. Light, nanomaterials, nanotechnologies (L2n) Laboratory, CNRS ERL 7004, Université de Technologie de Troyes, F-10004 Troyes, France

6. Sino-European School of Technology, Shanghai University, 200444 Shanghai, China

Funder

Agence Nationale de la Recherche

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.1c01693

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