Surface and Near Surface Area Density of States for Magnetron-Sputtered ZnO and Al-ZnO: A MIES, UPS, and VBXPS Study Investigating Ultrahigh Vacuum Sputter Cleaning and UV Oxygen Plasma-Reference-Cited by-同舟云学术

Surface and Near Surface Area Density of States for Magnetron-Sputtered ZnO and Al-ZnO: A MIES, UPS, and VBXPS Study Investigating Ultrahigh Vacuum Sputter Cleaning and UV Oxygen Plasma

Published:2016-02-15 Issue:29 Volume:120 Page:15772-15784
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Schmerl Natalya M.¹,Gentle Angus R.²,Quinton Jamie S.¹,Smith Geoff B.²,Andersson Gunther G.¹

Affiliation:

1. Flinders Centre for Nanoscale Science and Technology, School of Chemistry and Physical Sciences, Flinders University of South Australia, Bedford Park, SA 5042, Australia

2. School of Mathematical and Physical Sciences, University of Technology Sydney, PO Box 123, Broadway, NSW 2007, Australia

Funder

Commonwealth Scientific and Industrial Research Organisation

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.5b11631

Reference68 articles.

1. ZnO-Based Transparent Conductive Thin Films: Doping, Performance, and Processing

2. ZnO Schottky barriers and Ohmic contacts