Prediction of Novel Tin Nitride SnxNy Phases Under Pressure-Reference-Cited by-同舟云学术

Prediction of Novel Tin Nitride SnxNy Phases Under Pressure

Published:2020-03-21 Issue:15 Volume:124 Page:8080-8093
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Wang Busheng¹,Larhlimi Rabii¹,Valencia Hubert²^ORCID,Guégan Frédéric¹,Frapper Gilles¹^ORCID

Affiliation:

1. Applied Quantum Chemistry Group, E4 Team, IC2MP UMR 7285, Université de Poitiers—CNRS, 4 rue Michel Brunet TSA 51106, 86073 Poitiers Cedex 9, France

2. Institute of Materials and Systems for Sustainability, Furo-cho, Chikusa, Nagoya 464-8603, Japan

Funder

Agence Nationale de la Recherche

Minist?re des Affaires ?trang?res

R?gion Nouvelle-Aquitaine

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.9b11404

Reference80 articles.

1. Tin Oxide—Sn3O4

2. Sn3O4: a novel heterovalent-tin photocatalyst with hierarchical 3D nanostructures under visible light

3. Electronic properties and stabilities of bulk and low-index surfaces of SnO in comparison withSnO2: A first-principles density functional approach with an empirical correction of van der Waals interactions

4. SnO2Quantum Dots and Quantum Wires: Controllable Synthesis, Self-Assembled 2D Architectures, and Gas-Sensing Properties

5. Formation of SnO2 Hollow Nanospheres inside Mesoporous Silica Nanoreactors

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