Reaction Stoichiometry and Mechanism of Pt Deposition via Surface Limited Redox Replacement of Copper UPD Layer on Au(111)-Reference-Cited by-同舟云学术

Reaction Stoichiometry and Mechanism of Pt Deposition via Surface Limited Redox Replacement of Copper UPD Layer on Au(111)

Author:

Yuan Qiuyi¹,Wakisaka Yuki¹,Uemura Yohei²,Wada Takahiro³^ORCID,Ariga-Miwa Hiroko¹,Takakusagi Satoru¹,Asakura Kiyotaka¹^ORCID,Brankovic Stanko R.⁴

Affiliation:

1. Intitute for Catalysis, Hokkaido University, Kita 21 Nishi 10, Kita-ku, Sapporo, Hokkaido 001-0021, Japan

2. Institute for Molecular Science, Okazaki, Aichi 444-0867, Japan

3. Tokyo Medical and Dental University, 1-5-45, Yushima, Bunkyo-ku, Tokyo 113-8549, Japan

4. Department of Electrical and Computer Engineering, University of Houston, Houston, Texas 77204-4005, United States

Funder

New Energy and Industrial Technology Development Organization

Division of Chemical, Bioengineering, Environmental, and Transport Systems

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

Reference40 articles.

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

5. SR Applications for Fuel Cell Electrodes;Synchrotron Radiation News;2020-10-01